Title :
Cleaning of EUVL masks using 172-nm and 13.5-nm radiation
Author :
Hamamoto, Kazuhiro ; Watanabe, Take ; Sakaya, Nonyuki ; Hosoya, Mono ; Shoki, Tsutomu ; Hada, Hideo ; Hishinuma, Nobuyuki ; Sugawara, Hiroshi ; Kinoshita, Hiroo
Author_Institution :
Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
Abstract :
In this paper, we describes the cleaning of masks 172-nm excimer VUV radiation, which is more efficient for masks than the others.
Keywords :
masks; surface cleaning; surface contamination; ultraviolet radiation effects; 13.5 nm; 172 nm; EUV mask; VUV radiation effects; surface cleaning; surface contamination; Cleaning; Optical films; Pollution measurement; Reflectivity; Rough surfaces; Surface contamination; Surface roughness; Synchrotrons; Thickness measurement; Ultraviolet sources;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268755
