• DocumentCode
    2581148
  • Title

    Cleaning of EUVL masks using 172-nm and 13.5-nm radiation

  • Author

    Hamamoto, Kazuhiro ; Watanabe, Take ; Sakaya, Nonyuki ; Hosoya, Mono ; Shoki, Tsutomu ; Hada, Hideo ; Hishinuma, Nobuyuki ; Sugawara, Hiroshi ; Kinoshita, Hiroo

  • Author_Institution
    Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    280
  • Lastpage
    281
  • Abstract
    In this paper, we describes the cleaning of masks 172-nm excimer VUV radiation, which is more efficient for masks than the others.
  • Keywords
    masks; surface cleaning; surface contamination; ultraviolet radiation effects; 13.5 nm; 172 nm; EUV mask; VUV radiation effects; surface cleaning; surface contamination; Cleaning; Optical films; Pollution measurement; Reflectivity; Rough surfaces; Surface contamination; Surface roughness; Synchrotrons; Thickness measurement; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268755
  • Filename
    1268755
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2581148