• DocumentCode
    2581214
  • Title

    Resist outgassing characteristics in EUVL

  • Author

    Watanabe, T. ; Hamamoto, K. ; Kinoshita, H. ; Hada, H. ; Komano, H.

  • Author_Institution
    Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    288
  • Lastpage
    289
  • Abstract
    In this article explain the importance of outgassing and its characteristics in EUVL. Here discuss the decomposition reaction of the resist in EUV irradiation.
  • Keywords
    decomposition; dissociation; outgassing; resists; ultraviolet lithography; ultraviolet radiation effects; EUV irradiation; decomposition; extreme ultraviolet lithography; resist outgassing characteristics; Chemicals; Hydrocarbons; Laboratories; Lithography; Materials science and technology; Mirrors; Protection; Resists; Solvents; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268759
  • Filename
    1268759
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2581214