DocumentCode :
2581283
Title :
Fabrication of poly silicon field emitter arrays with hafnium carbide coating for TFT controlled field emission displays
Author :
Nagao, M. ; Sacho, Y. ; Sato, T. ; Matsukawa, T. ; Kanemaru, S. ; Itoh, J.
Author_Institution :
Nat. Inst. of Adv. Ind. Sci. & Technol., Japan
fYear :
2003
fDate :
29-31 Oct. 2003
Firstpage :
298
Lastpage :
299
Abstract :
In this paper, we have reported the effect of HfC coating and the fabrication of HfC-coated poly-Si FEAs.
Keywords :
elemental semiconductors; field emission displays; field emitter arrays; hafnium compounds; silicon; spin coating; sputter etching; thin film transistors; HfC coated poly Si FEAs; HfC coating; HfC-Si; TFT controlled field emission displays; hafnium carbide coating; poly silicon field emitter arrays; Coatings; Fabrication; Field emitter arrays; Flat panel displays; Glass; Hafnium; Hybrid fiber coaxial cables; Silicon; Substrates; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
Type :
conf
DOI :
10.1109/IMNC.2003.1268764
Filename :
1268764
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2581283
بازگشت