DocumentCode
2581357
Title
Alignment offset analyzer against Wafer Induced Shift (WIS)
Author
Ina, H. ; Matsumoto, T. ; Sentoku, K.
Author_Institution
Nanotechnol. & Adv. Syst. Res. Labs., Canon Inc., Tochigi, Japan
fYear
2003
fDate
29-31 Oct. 2003
Firstpage
308
Abstract
Summary form only given. In this article, we demonstrate an error analyser to quantify the wafer induced shift alignment error using atomic force microscopy (AFM) and optical simulation. We have called this analyser the ´Alignment Offset Analyser´.
Keywords
atomic force microscopy; elemental semiconductors; error analysis; etching; lithography; resists; silicon; AFM; Si; alignment offset analyzer; atomic force microscopy; error analyser; lithography; optical simulation; resists; silicon; wafer induced shift; Analytical models; Atom optics; Atomic force microscopy; Laboratories; Lithography; Measurement errors; Nanotechnology; Optical microscopy; Resists; Surfaces;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location
Tokyo, Japan
Print_ISBN
4-89114-040-2
Type
conf
DOI
10.1109/IMNC.2003.1268769
Filename
1268769
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