DocumentCode :
2581521
Title :
Optimum incident angle of Ar cluster ion beam for super hard carbon film deposition
Author :
Kitagawa, T. ; Miyauchi, K. ; Toyoda, N. ; Tsubakino, H. ; Yamada, I.
Author_Institution :
Lab. of Adv. Sci. & Technol. for Ind., Himeji Inst. of Technol., Hyogo, Japan
fYear :
2003
fDate :
29-31 Oct. 2003
Firstpage :
328
Lastpage :
329
Abstract :
In this paper, we study influences of incident angles of Ar cluster ions during depositions on the carbon film properties, by bombardment of Ar cluster ions with various incident angles. Additionally, the angles to obtain the super hard carbon film were also optimized.
Keywords :
EXAFS; argon; diamond-like carbon; hardness; ion beam assisted deposition; thin films; Ar; Ar cluster ion beam; C; bombardment; incident angle; super hard carbon film deposition; Acceleration; Argon; Atomic measurements; Collaboration; Electromagnetic wave absorption; Extraterrestrial measurements; Ion beams; Sputtering; Substrates; Toy industry;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
Type :
conf
DOI :
10.1109/IMNC.2003.1268779
Filename :
1268779
Link To Document :
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