Title :
AFM cantilever array for parallel lithography of quantum devices
Author :
Kakushima, K. ; Watanabe, M. ; Shimamoto, K. ; Gouda, T. ; Ataka, M. ; Mimura, H. ; Isono, Y. ; Hashiguchi, G. ; Mihara, Y. ; Fujita, H.
Abstract :
Arrayed AFM probes have been fabricated, and parallel scanning probe lithography (SPL) has been demonstrated to draw uniform patterns with good alignment accuracy. We have shown that the combination of UV lithography with parallel SPL is feasible for fabrication of quantum devices with high throughput. Arrayed AFM with 50 probes are under fabrication.
Keywords :
atomic force microscopy; nanolithography; quantum interference devices; scanning probe microscopy; silicon; silicon compounds; AFM cantilever array; SET; Si-SiO/sub 2/-Si/sub 3/N/sub 4/; parallel lithography; quantum devices; scanning probe lithography; single electron device; Atomic force microscopy; Etching; Fabrication; Laser beams; Lithography; Probes; Scanning electron microscopy; Self-assembly; Sensor arrays; Temperature;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268783
