Title :
Fabrication of low line edge roughness mold for photo-nanoimprint
Author :
Kurashima, Y. ; Hiroshima, H. ; Komuro, M. ; Kim, S. ; Yamazaki, N. ; Taniguchi, J. ; Miyamoto, I. ; Namatsu, H. ; Matsui, S.
Author_Institution :
AIST, XXX, Japan
Abstract :
In this paper, we fabricate low LER pattern on Spin On Glass (SOG) by simple nanoimprint process using a Si master mold obtained by anisotropic wet etching.
Keywords :
elemental semiconductors; etching; nanolithography; photolithography; silicon; Si; Si master mold; anisotropic wet etching; low line edge roughness mold; photonanoimprint; Anisotropic magnetoresistance; Atomic force microscopy; Atomic measurements; Dry etching; Electron beams; Fabrication; Force measurement; Optical films; Scanning electron microscopy; Wet etching;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268785
