Title :
Simulation of polymer deformation for various shaped patterns in thermal nano imprint lithography
Author :
Hirai, Y. ; Yoshida, S. ; Konishi, T.
Author_Institution :
Mech. Syst. Eng., Osaka Prefecture Univ., Sakai, Japan
Abstract :
In this paper, we review the resist deformation process for various aspect ratio and duty ratio in variation with the initial resist polymer thickness by numerical simulation and experiment.
Keywords :
deformation; nanolithography; numerical analysis; polymers; resists; numerical simulation; polymer resist deformation; thermal nano imprint lithography; Deformable models; Fabrication; Lithography; Mechanical systems; Polymers; Pressing; Resists; Rubber; Systems engineering and theory; Thermal engineering;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268787
