Title :
Integration Of Ultra-low-k Xerogel Gapfill Dielectric For high Performance Sub-o.18 /spl mu/m Interconnects
Author :
List, R.S. ; Jin, C. ; Russell, S.W. ; Yamanaka, S. ; Olsen, L. ; Le, L. ; Ting, L.M. ; Havemann, R.H.
Author_Institution :
Semiconductor Process and Device Center, Texas Instruments, PO Box 655012, MS 457, Dallas, Texas 75265
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
DOI :
10.1109/VLSIT.1997.623703
