• DocumentCode
    2585584
  • Title

    A Methodology to Characterize the Low-Frequency Noise of InP Based Transistors

  • Author

    De Souza, A. A Lisboa ; Nallatamby, J.C. ; Prigent, M.

  • Author_Institution
    Xlim -Dept., Univ. de Limoges, Limoges
  • fYear
    2008
  • fDate
    27-28 Oct. 2008
  • Firstpage
    123
  • Lastpage
    126
  • Abstract
    This paper describes a methodology to measure the low-frequency noise of InP-based transistors. These transistors have demonstrated transition frequencies (ft) greater than 200 GHz, generally achieved at current densities in excess of 200 kA/cm2. Depending on the DC current gain, this may represent base currents of some mA. For the first time, curves of Sib, Sic and Sibic for base currents of up to 3 mA are demonstrated, in excellent agreement with those obtained from one-port measurements. This is only possible with an accurate experimental characterisation of the small-signal parameters of the transistor, which are frequency-dependent due to self-heating.
  • Keywords
    III-V semiconductors; current density; indium compounds; semiconductor device noise; transistors; DC current gain; InP; base currents; current densities; low-frequency noise; one-port measurements; self-heating; small-signal parameters; transistors; transition frequencies; Bipolar transistors; Circuit noise; Current measurement; Frequency; Impedance; Indium phosphide; Low-frequency noise; Noise measurement; Silicon carbide; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Integrated Circuit Conference, 2008. EuMIC 2008. European
  • Conference_Location
    Amsterdam
  • Print_ISBN
    978-2-87487-007-1
  • Type

    conf

  • DOI
    10.1109/EMICC.2008.4772244
  • Filename
    4772244