DocumentCode
2587185
Title
Mechanical Stress Induced MOSFET Punch-through And Process Optimization For Deep Submicron TEOS-O/sub 3/ Filled STI Device
Author
Ishimaru, K. ; Matsuoka, F. ; Takahashi, M. ; Nishigohri, M. ; Okayama, Y. ; Unno, Y. ; Yabuki, M. ; Umezawa, K. ; Tsuchiya, N. ; Fujii, O. ; Kinugawa, M.
Author_Institution
Toshiba Microelectronics Corp. 1, Komukai-Toshiba-cho, Saiwaiku, Kawasaki 21 O,Japan
fYear
1997
fDate
10-12 June 1997
Firstpage
123
Lastpage
124
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN
4-930813-75-1
Type
conf
DOI
10.1109/VLSIT.1997.623729
Filename
623729
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