Title :
A manufacturable, 26 GHz GaAs MMIC technology
Author :
D´Avanzo, D.C. ; Estreich, D.B. ; Taylor, T.W. ; Kondoh, H. ; Orr, J. ; Quach, A. ; Wong, E.H. ; Yeats, R. ; Makker, V.K. ; Fisher, R.A.
Author_Institution :
Hewlett-Packard, Santa Rosa, CA, USA
Abstract :
A 26 GHz MMIC technology has been developed to manufacture high performance integrated circuits for microwave instrumentation. The fabrication process features an MBE active layer, a 0.4 mu m gate patterned by DUV contact lithography, Ta/sub 2/N thin-film resistors, Si/sub 3/N/sub 4/ MIM capacitors and dry-etched backside vias. The completed MESFET has a nominal f/sub t/ of 23 GHz and a f/sub max/ of 55 GHz. Two standard products are currently being manufactured. The first is a 2-26.5 GHz travelling wave amplifier (TWA) which routinely achieves 8.7 dB+or-0.5 dB gain across the band with 21 dBm saturated output power and a noise figure of better than 8 dB at 18 GHz. RF yield to a gain spec of 7 dB at 26.5 GHz and 10 dB input and output return loss is 40%. The second product is a DC-50 GHz variable attenuator which achieves 72% yield to a 26.5 GHz spec of 2.4 dB minimum insertion loss, 27 dB maximum attenuation and greater than 8 dB input and output return loss.<>
Keywords :
III-V semiconductors; MMIC; Schottky gate field effect transistors; attenuators; field effect integrated circuits; gallium arsenide; integrated circuit manufacture; microwave amplifiers; 0 to 50 GHz; 0.4 micron; 2 to 26.5 GHz; 2.4 to 10 dB; 26 GHz; 7 to 9.2 dB; 8 dB; DUV contact lithography; GaAs; III-V semiconductors; MBE active layer; MESFET; MIM capacitors; MMIC technology; SHF; Si/sub 3/N/sub 4/; TWA; Ta/sub 2/N; distributed amplifier; dry-etched backside vias; fabrication process; input/output return loss; manufacture; minimum insertion loss; monolithic microwave IC; thin-film resistors; travelling wave amplifier; variable attenuator; Fabrication; Gallium arsenide; Instruments; Integrated circuit manufacture; Integrated circuit technology; MMICs; Manufacturing; Microwave integrated circuits; Microwave technology; Power amplifiers;
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1988. Technical Digest 1988., 10th Annual IEEE
Conference_Location :
Nashville, Tennessee, USA
DOI :
10.1109/GAAS.1988.11085