Modeling And Characterization Of N/sup +/- And P/sup +/-polysilicon-gated Ultra Thin Oxides (21-26 /spl Aring/)

Author

Lo, S.-H. ; Buchanan, D.A. ; Taur, Y. ; Han, L.-K. ; Wu, E.

Author_Institution

IBM T. J. Watson Research Center, Yorktown Heights, NY 21BM SRDC, Hopewell Junction, NY

fYear

1997

fDate

10-12 June 1997

Firstpage

149

Lastpage

150

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

Print_ISBN

4-930813-75-1

Type

DOI

10.1109/VLSIT.1997.623742

Filename

623742

Link To Document