A probabilistic collocation method based statistical gate delay model considering process variations and multiple input switching

Since the advent of new nanotechnologies, the variability of gate delay due to process variations has become a major concern. This paper proposes a new gate delay model that includes impact from both process variations and multiple input switching. The proposed model uses an orthogonal polynomial based probabilistic collocation method to construct a delay analytical equation from circuit timing performance. From the experimental results, our approach has less that 0.2% error on the mean delay of gates and less than 3% error on the standard deviation.