Title :
Numerical Simulation of Ellipsometry Measurement in Millimeter-Wave Band
Author :
Xianwang, Yang ; Minning, Ji ; Mingxiang, Li
Author_Institution :
Sch. of Commun. & Inf. Eng., Shanghai Univ., Shanghai
Abstract :
A new ellipsometry method for measuring the permittivity and thickness of dielectric materials at millimeter wavelength is presented in this paper. The relationship between ellipsometric parameters and dielectric material parameters is investigated by numerical simulation. The results show that different permittivities and different thicknesses may correspond to same ellipsometric parameters. However, for most dielectric films which are widely used, the permittivity and thickness can be determined uniquely.
Keywords :
dielectric materials; dielectric thin films; millimetre wave measurement; permittivity measurement; thickness measurement; dielectric films; dielectric material thickness; ellipsometry measurement; millimeter-wave band measurement; permittivity measurement; Dielectric films; Dielectric materials; Dielectric measurements; Ellipsometry; Millimeter wave measurements; Millimeter wave technology; Numerical simulation; Permittivity measurement; Thickness measurement; Wavelength measurement; ellipsometry; millimeter wave; numerical simulation; permittivity;
Conference_Titel :
Microwave Conference, 2008 China-Japan Joint
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-3821-1
DOI :
10.1109/CJMW.2008.4772530
