Title :
Computer-aided recipe generation for LPCVD reactors
Author :
Lin, Kuang-Kuo ; Spanos, Costas J.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Abstract :
A computer-aided-design (CAD) system which has been developed to assist the process engineer in choosing the best compromise between product and equipment performance is described. A formal, systematic methodology that facilities the task of recipe design for low pressure chemical-vapor-deposition (LPCVD) reactors is discussed. Recipe generation via interactive response surface exploration and automatic recipe generation via numerical optimization are discussed
Keywords :
CAD; chemical vapour deposition; electronic engineering computing; semiconductor growth; CAD; LPCVD reactors; automatic recipe generation; chemical-vapor-deposition; computer-aided-design; interactive response surface exploration; low pressure CVD; numerical optimization; Computer aided manufacturing; Graphics; Inductors; Manufacturing processes; Optical films; Process design; Response surface methodology; Semiconductor device manufacture; Stress; Very large scale integration;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990
Conference_Location :
Danvers, MA
DOI :
10.1109/ASMC.1990.111209
