DocumentCode :
2591185
Title :
Hub-centered production control of wafer fabrication
Author :
Lou, Sheldon ; Yan, Houmin ; Sethi, Suresh ; Gardel, Anne ; Deosthali, Prabhat
Author_Institution :
Fac. of Manage., Toronto Univ., Ont., Canada
fYear :
1990
fDate :
11-12 Sep 1990
Firstpage :
27
Lastpage :
32
Abstract :
A flow-rate control policy to manage the production of a wafer fabrication facility is described. The policy is derived by formulating and solving a stochastic control problem. The results are then used to develop two sets of production control rules. The first one adjusts the lot release by determining when and how many new lots should be started. The second one controls the reentrant process in the photolithography area, commonly known as the hub. The control rules are robust against random disturbances because they provide a feedback control based on the information of the entire shop floor
Keywords :
feedback; integrated circuit manufacture; production control; semiconductor device manufacture; feedback control; flow-rate control policy; hub-centred production control; photolithography area; reentrant process; shop floor information; stochastic control problem; wafer fabrication facility; Cellular manufacturing; Dispatching; Electric breakdown; Fabrication; Feedback control; Job shop scheduling; Lithography; Production control; Semiconductor device manufacture; Semiconductor device modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990
Conference_Location :
Danvers, MA
Type :
conf
DOI :
10.1109/ASMC.1990.111216
Filename :
111216
Link To Document :
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