DocumentCode :
2591675
Title :
Polyimide stress buffers in IC technology
Author :
Schuckert, Craig ; Murray, Dan ; Roberts, Carl ; Cheek, Gary ; Goida, Tom
Author_Institution :
DuPont Co., Wilmington, DE, USA
fYear :
1990
fDate :
11-12 Sep 1990
Firstpage :
72
Lastpage :
74
Abstract :
A photoimagable polyimide layer which has been evaluated as a stress relief buffer for use with integrated circuits (ICs) packaged in plastic is discussed. The wafer-level overcoat process is manufacturable using available spin coat and develop tracks and is compared to conventional post wirebond die overcoating. Some properties of the polyimide layer, the manufacturing process, and the results achieved on actual commercial products are reviewed
Keywords :
integrated circuit manufacture; integrated circuit technology; polymer films; IC technology; integrated circuits; manufacturing process; photoimagable polyimide layer; plastic packaged ICs; spin coat/develop process; stress relief buffer; wafer-level overcoat process; Coatings; Dielectric thin films; Manufacturing processes; Packaging; Plastics; Polyimides; Semiconductor device manufacture; Semiconductor materials; Spine; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990
Conference_Location :
Danvers, MA
Type :
conf
DOI :
10.1109/ASMC.1990.111222
Filename :
111222
Link To Document :
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