Title :
Novel fabrication process and structure of a low-voltage-operation micromirror array for optical MEMS switches
Author :
Urano, M. ; Ishii, H. ; Tanabe, Y. ; Shimamura, T. ; Sakata, T. ; Kamei, T. ; Kudou, K. ; Yano, M. ; Machida, K.
Author_Institution :
NTT Microsystem Integration Labs, Kanagawa, Japan
Abstract :
This paper describes a novel fabrication process for control electrodes which enables a micromirror array to be fabricated on LSIs. Electrodes designed to reduce drive voltage of the micromirror can be fabricated flexibly. Novel anti-sticking technology, in which a polyimide film is deposited only on control electrodes, prevents sticking between mirrors and electrodes. We fabricated a 100-ch micromirror array. The maximum rotational angle of 1/spl deg/ at 30 V was achieved using our developed technology.
Keywords :
electrodes; integrated optics; micromirrors; microswitches; optical arrays; optical fabrication; optical switches; photolithography; planarisation; step response; anti-sticking technology; control electrodes; electroplating; fabrication process; low-voltage-operation micromirror array; maximum rotational angle; one-chip integration; optical MEMS switch; photolithography; photonic networks; photosensitive coating; planarization; polyimide film; resist patterning; sacrificial layer; screen printing; step response; Electrodes; Micromirrors; Microswitches; Mirrors; Optical arrays; Optical device fabrication; Optical films; Polyimides; Process control; Voltage;
Conference_Titel :
Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-7872-5
DOI :
10.1109/IEDM.2003.1269439