• DocumentCode
    2591992
  • Title

    Novel fabrication process and structure of a low-voltage-operation micromirror array for optical MEMS switches

  • Author

    Urano, M. ; Ishii, H. ; Tanabe, Y. ; Shimamura, T. ; Sakata, T. ; Kamei, T. ; Kudou, K. ; Yano, M. ; Machida, K.

  • Author_Institution
    NTT Microsystem Integration Labs, Kanagawa, Japan
  • fYear
    2003
  • fDate
    8-10 Dec. 2003
  • Abstract
    This paper describes a novel fabrication process for control electrodes which enables a micromirror array to be fabricated on LSIs. Electrodes designed to reduce drive voltage of the micromirror can be fabricated flexibly. Novel anti-sticking technology, in which a polyimide film is deposited only on control electrodes, prevents sticking between mirrors and electrodes. We fabricated a 100-ch micromirror array. The maximum rotational angle of 1/spl deg/ at 30 V was achieved using our developed technology.
  • Keywords
    electrodes; integrated optics; micromirrors; microswitches; optical arrays; optical fabrication; optical switches; photolithography; planarisation; step response; anti-sticking technology; control electrodes; electroplating; fabrication process; low-voltage-operation micromirror array; maximum rotational angle; one-chip integration; optical MEMS switch; photolithography; photonic networks; photosensitive coating; planarization; polyimide film; resist patterning; sacrificial layer; screen printing; step response; Electrodes; Micromirrors; Microswitches; Mirrors; Optical arrays; Optical device fabrication; Optical films; Polyimides; Process control; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International
  • Conference_Location
    Washington, DC, USA
  • Print_ISBN
    0-7803-7872-5
  • Type

    conf

  • DOI
    10.1109/IEDM.2003.1269439
  • Filename
    1269439