DocumentCode :
2596839
Title :
Overview of wafer direct bonding technology: From substrate engineering to heterogeneous integration enabled by 3D wafer stacking
Author :
Radu, Ionut
Author_Institution :
Parc Technol. des Fontaines, SOITEC, Bernin, France
fYear :
2012
fDate :
22-23 May 2012
Firstpage :
25
Lastpage :
25
Abstract :
The recent advances of the wafer direct bonding technology will be presented in this talk. The overview covers the technology perspective with respect to the fabrication of engineered substrates as well as 3D wafer stacking in light of the different applications for semiconductor industry.
Keywords :
three-dimensional integrated circuits; wafer bonding; 3D wafer stacking; engineered substrate; heterogeneous integration; semiconductor industry; substrate engineering; wafer direct bonding technology; Bonding; Micromechanical devices; Silicon; Silicon on insulator technology; Stacking; Substrates; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Low Temperature Bonding for 3D Integration (LTB-3D), 2012 3rd IEEE International Workshop on
Conference_Location :
Tokyo
Print_ISBN :
978-1-4673-0743-7
Type :
conf
DOI :
10.1109/LTB-3D.2012.6238043
Filename :
6238043
Link To Document :
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