Title :
Numerical Solution Of Diffusion Equations On Time-variant Domains
Author :
Paffrath, M. ; Steger, K.
Author_Institution :
SIEMENS AG
Keywords :
Computational modeling; Differential equations; Doping profiles; Grid computing; Mesh generation; Oxidation; Research and development; Semiconductor process modeling; Shape; Silicon;
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
DOI :
10.1109/NUPAD.1990.748252
