Title :
Rta-simulations With the 2-d Process Simulator Promis
Author :
Hobler, G. ; Halania, S. ; Wimmer, K. ; Selberherr, S. ; Pötzl, H.
Author_Institution :
Technical University of Vienna
Keywords :
Diffusion processes; Ion implantation; Jitter; Kinetic theory; Monte Carlo methods; Production; Rapid thermal annealing; Rapid thermal processing; Simulated annealing; Trajectory;
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
DOI :
10.1109/NUPAD.1990.748253
