DocumentCode
2596876
Title
Rta-simulations With the 2-d Process Simulator Promis
Author
Hobler, G. ; Halania, S. ; Wimmer, K. ; Selberherr, S. ; Pötzl, H.
Author_Institution
Technical University of Vienna
fYear
1990
fDate
3-4 Jun 1990
Firstpage
13
Lastpage
14
Keywords
Diffusion processes; Ion implantation; Jitter; Kinetic theory; Monte Carlo methods; Production; Rapid thermal annealing; Rapid thermal processing; Simulated annealing; Trajectory;
fLanguage
English
Publisher
ieee
Conference_Titel
Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
Type
conf
DOI
10.1109/NUPAD.1990.748253
Filename
748253
Link To Document