Title :
Standardization of CMOS unit process development
Author_Institution :
Hewlett-Packard Corp., Palo Alto, CA, USA
Abstract :
A multipurpose mask set, consisting of three stepper reticles, contains 95% of all test structures required for complementary metal-oxide semiconductor (CMOS) process development. Techniques, adopted from discrete mathematics, optimally integrate design, processing, parametric test, and data analysis activities. Standard unit processes are discussed. A comprehensive analysis of photolithography is conducted.
Keywords :
CMOS integrated circuits; integrated circuit technology; integrated circuit testing; masks; photolithography; standardisation; CMOS unit process development; data analysis; multipurpose mask set; parametric test; photolithography; standardisation; stepper reticles; test structures; Automatic testing; CMOS process; Circuit testing; Data analysis; Dielectrics; Lithography; Probes; Software testing; Software tools; Standardization;
Conference_Titel :
Microelectronic Test Structures, 1989. ICMTS 1989. Proceedings of the 1989 International Conference on
Print_ISBN :
0-87942-714-0
DOI :
10.1109/ICMTS.1989.39278
