DocumentCode :
2598148
Title :
The effect of contact geometry on the value of contact resistivity extracted from Kelvin structures
Author :
Findlay, K.W.J. ; Alexander, W.J.C. ; Walton, A.J.
Author_Institution :
Dept. of Electr. Eng., Edinburgh Univ., UK
fYear :
1989
fDate :
13-14 March 1989
Firstpage :
133
Lastpage :
138
Abstract :
A finite-element program that can model arbitrarily shaped contacts has been developed. It is used to evaluate the effects that changes in geometry, specific contact resistivity, sheet resistivity, and the modification of sheet resistivity under the contact have on contact systems. The Kelvin test structure is used to illustrate some of its capabilities. It is shown that the contact area of this test structure is of primary importance. The contact shape has little influence on the extracted value of contact resistance.
Keywords :
contact resistance; finite element analysis; metallisation; ohmic contacts; semiconductor-metal boundaries; Kelvin structures; arbitrarily shaped contacts; contact area; contact geometry; contact resistivity; finite-element program; ohmic contacts; sheet resistivity; test structure; Buildings; Conductivity; Contact resistance; Geometrical optics; Geometry; Kelvin; Lithography; Mesh generation; Resistors; Shape;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1989. ICMTS 1989. Proceedings of the 1989 International Conference on
Print_ISBN :
0-87942-714-0
Type :
conf
DOI :
10.1109/ICMTS.1989.39297
Filename :
39297
Link To Document :
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