DocumentCode :
2598311
Title :
Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach (MOS test structure)
Author :
Walls, J.A. ; Walton, A.J. ; Robertson, J.M. ; Crawford, T.M.
Author_Institution :
Microfabrication Facility, Edinburgh Univ., UK
fYear :
1989
fDate :
13-14 March 1989
Firstpage :
193
Lastpage :
199
Abstract :
The authors demonstrate how a pattern-recognition system can be applied to the interpretation of C-V curves on an MOS test structure. The system is capable of automatically sequencing the appropriate measurements required to extract accurately the maximum amount of information available from C-V and G-V measurements. Unlike many other expert systems, CV-ASSIST is an integral part of the measurement, instrumentation, and control software and is thus able to call up a sequence of individually tailored tests for the MOS test structure under investigation.
Keywords :
automatic test equipment; capacitance measurement; computerised pattern recognition; expert systems; metal-insulator-semiconductor devices; process control; semiconductor device testing; C-V measurements; CV-ASSIST; G-V measurements; MOS capacitors; MOS test structure; control software; expert systems; instrumentation software; pattern-recognition approach; process fault diagnosis; sequencing; Automatic control; Automatic testing; Capacitance-voltage characteristics; Data mining; Expert systems; Fault diagnosis; Instruments; Software measurement; Software testing; System testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microelectronic Test Structures, 1989. ICMTS 1989. Proceedings of the 1989 International Conference on
Print_ISBN :
0-87942-714-0
Type :
conf
DOI :
10.1109/ICMTS.1989.39308
Filename :
39308
Link To Document :
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