• DocumentCode
    2598311
  • Title

    Automating and sequencing C-V measurements for process fault diagnosis using a pattern-recognition approach (MOS test structure)

  • Author

    Walls, J.A. ; Walton, A.J. ; Robertson, J.M. ; Crawford, T.M.

  • Author_Institution
    Microfabrication Facility, Edinburgh Univ., UK
  • fYear
    1989
  • fDate
    13-14 March 1989
  • Firstpage
    193
  • Lastpage
    199
  • Abstract
    The authors demonstrate how a pattern-recognition system can be applied to the interpretation of C-V curves on an MOS test structure. The system is capable of automatically sequencing the appropriate measurements required to extract accurately the maximum amount of information available from C-V and G-V measurements. Unlike many other expert systems, CV-ASSIST is an integral part of the measurement, instrumentation, and control software and is thus able to call up a sequence of individually tailored tests for the MOS test structure under investigation.
  • Keywords
    automatic test equipment; capacitance measurement; computerised pattern recognition; expert systems; metal-insulator-semiconductor devices; process control; semiconductor device testing; C-V measurements; CV-ASSIST; G-V measurements; MOS capacitors; MOS test structure; control software; expert systems; instrumentation software; pattern-recognition approach; process fault diagnosis; sequencing; Automatic control; Automatic testing; Capacitance-voltage characteristics; Data mining; Expert systems; Fault diagnosis; Instruments; Software measurement; Software testing; System testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1989. ICMTS 1989. Proceedings of the 1989 International Conference on
  • Print_ISBN
    0-87942-714-0
  • Type

    conf

  • DOI
    10.1109/ICMTS.1989.39308
  • Filename
    39308