Title :
Design and fabrication considerations in developing high-Q MEMS capacitors and inductors
Author :
Rais-Zadeh, Mina
Author_Institution :
Solid-State Lab., Univ. of Michigan, Ann Arbor, MI, USA
Abstract :
Despite great advancement in micromachining techniques, design and fabrication of high-Q tunable capacitors and inductors remain to be a challenging task. This paper discusses the design and fabrication considerations in developing high-Q fixed and tunable micro-electromechanical capacitors and inductors. Electrostatic actuation mechanism is employed for tuning the value of passives. The measurement results of several high-Q capacitors and inductors fabricated on silicon substrate are presented, and a number of research directions to improve the performance of tunable passives are proposed.
Keywords :
Q-factor; capacitors; electrostatic actuators; inductors; micromachining; micromechanical devices; Si; electrostatic actuation mechanism; fixed microelectromechanical capacitor; inductor; micromachining technique; tunable microelectromechanical capacitor; Capacitors; Fabrication; Inductors; Micromechanical devices; Substrates; Switches; Tuning; Passives; quality factor; tunable capacitor; tunable inductors;
Conference_Titel :
Silicon Monolithic Integrated Circuits in RF Systems (SiRF), 2011 IEEE 11th Topical Meeting on
Conference_Location :
Phoenix, AZ
Print_ISBN :
978-1-4244-8060-9
DOI :
10.1109/SIRF.2011.5719335
