DocumentCode
2600732
Title
Creation of Interface States by Avalanche Effect
Author
Nicollian, E.H. ; Goetzberger, A.
Author_Institution
Bell Telephone Laboratories, Incorporated, Murray Hill, New Jersey
fYear
1967
fDate
Nov. 1967
Firstpage
66
Lastpage
67
Abstract
Charge and interface states are introduced into the oxide in an MOS capacitor by producing avalanche break-down at the semiconductor surface. Both the charge trapped in the oxide and the interface states can be annealed out at low temperatures.
Keywords
Avalanche breakdown; Breakdown voltage; Capacitance-voltage characteristics; Density measurement; Interface states; Laboratories; MOS capacitors; Silicon; Surface treatment; Telephony;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1967. Sixth Annual
Conference_Location
Los Angeles, CA, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1967.362395
Filename
4207758
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