DocumentCode :
2600854
Title :
Exposing and Analyzing P-N Junction Defects
Author :
Morton, T.P.
Author_Institution :
UNIVAC, St. Paul, Minnesota
fYear :
1967
fDate :
Nov. 1967
Firstpage :
114
Lastpage :
119
Abstract :
Exeriments have shown that some localized P-N Junction defects can be located and exposed for analysis by making a metallurgical cross section of the junction while its abnormal reverse current-voltage characteristic is being monitored on a curve tracer. The gradual improvement of the anomalous characteristic indicates that the cross section surface is passing through the defect region. Analysis of the exposed defect may then yield defect size, current densities, carrier generation rates and other information.
Keywords :
Abrasives; Breakdown voltage; Current-voltage characteristics; Diodes; Electric breakdown; Information analysis; Lapping; Monitoring; P-n junctions; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1967. Sixth Annual
Conference_Location :
Los Angeles, CA, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1967.362402
Filename :
4207765
Link To Document :
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