DocumentCode

2601631

Title

CMOS Devices - Metal Gate & High-K Gate Dielectric

Author

Yoon, Jong Shik ; Thean, Aaron

Author_Institution

Samsung Electronics

fYear

2007

fDate

10-12 Dec. 2007

Firstpage

47

Lastpage

47

Keywords

CMOS technology; High K dielectric materials; High-K gate dielectrics; Inorganic materials; Paper technology; Physics; Semiconductor materials; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Electron Devices Meeting, 2007. IEDM 2007. IEEE International

Conference_Location

Washington, DC

Print_ISBN

978-1-4244-1507-6

Electronic_ISBN

978-1-4244-1508-3

Type

conf

DOI

10.1109/IEDM.2007.4418859

Filename

4418859