DocumentCode :
2602009
Title :
Electrical Continuity Testing of Passivated Metallization by Scanning Electron Microscopy
Author :
Lukianoff, G.V. ; Mullaney, R.C.
Author_Institution :
IBM Components Division, East Fishkill Facility, Hopewell Junction, New York 12533
fYear :
1970
fDate :
25659
Firstpage :
244
Lastpage :
246
Keywords :
Conducting materials; Contacts; Electron beams; Electron optics; Inspection; Metallization; Probes; Scanning electron microscopy; Semiconductor device testing; Semiconductor devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1970. 8th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1970.362466
Filename :
4207832
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2602009
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