Title :
Process Technology - Advanced Junctions, Silicides and Novel Stress Engineering
Author :
Kase, Masataka ; Murthy, Anand
Author_Institution :
Fujitsu Limited
Keywords :
Annealing; CMOS technology; Epitaxial growth; Nickel; Paper technology; Silicides; Stress;
Conference_Titel :
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4244-1507-6
Electronic_ISBN :
978-1-4244-1508-3
DOI :
10.1109/IEDM.2007.4418880
