DocumentCode :
2602195
Title :
Extraction of critical areas for opens in large VLSI circuits
Author :
Ouyang, Charles H. ; Pleskacz, Witold A. ; Maly, Wojciech
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
fYear :
1996
fDate :
6-8 Nov 1996
Firstpage :
21
Lastpage :
29
Abstract :
This paper describes a new algorithm for the extraction of the critical area for opens. The presented algorithm allows for the analysis of large ICs and non-Manhattan geometry. Concept of the contact/via contacting regions is proposed and its relevance is discussed. Illustrative examples of the proposed algorithm are presented
Keywords :
VLSI; fault location; integrated circuit testing; VLSI circuit; contact regions; critical areas; extraction algorithm; large IC; nonManhattan geometry; opens; via contacting regions; Algorithm design and analysis; Conducting materials; Contacts; Geometry; Insulation; Integrated circuit interconnections; Manufacturing; Modems; Very large scale integration; Yield estimation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Defect and Fault Tolerance in VLSI Systems, 1996. Proceedings., 1996 IEEE International Symposium on
Conference_Location :
Boston, MA
ISSN :
1550-5774
Print_ISBN :
0-8186-7545-4
Type :
conf
DOI :
10.1109/DFTVS.1996.571981
Filename :
571981
Link To Document :
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