DocumentCode :
2603106
Title :
Doped In-Ge-Te Phase Change Memory Featuring Stable Operation and Good Data Retention
Author :
Morikawa, T. ; Kurotsuchi, K. ; Kinoshita, M. ; Matsuzaki, N. ; Matsui, Y. ; Fuiisaki, Y. ; Hanzawa, S. ; Kotabe, A. ; Terao, M. ; Moriya, H. ; Iwasaki, T. ; Matsuoka, M. ; Nitta, F. ; Moniwa, M. ; Koga, T. ; Takaura, N.
Author_Institution :
Hitachi Ltd., Tokyo
fYear :
2007
fDate :
10-12 Dec. 2007
Firstpage :
307
Lastpage :
310
Abstract :
We have fabricated a phase change memory using doped In-Ge-Te to improve the data retention required for industrial and automotive use. This chalcogenide features higher thermal stability as well as denser texture and improved adhesion. The memory cell using doped In-Ge-Te provided a larger read margin and better data retention than conventional Ge2Sb2Tes, and we demonstrated 10-year retention at temperatures above 150degC, which is the highest temperature ever reported.
Keywords :
chalcogenide glasses; germanium compounds; indium compounds; phase change materials; semiconductor storage; Ge2Sb2Te5; chalcogenide features; data retention; denser texture; memory cell; phase change memory; stable operation; temperature 150 degC; thermal stability; Amorphous materials; Automotive engineering; Consumer products; Crystalline materials; Crystallization; Phase change materials; Phase change memory; Tellurium; Temperature; Thermal stability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4244-1507-6
Electronic_ISBN :
978-1-4244-1508-3
Type :
conf
DOI :
10.1109/IEDM.2007.4418932
Filename :
4418932
Link To Document :
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