Title :
Process Technology - Gate Stack Process I - Fundamental Aspects
Author :
Chin, Albert ; De Gendt, Stefan
Author_Institution :
National Chiao Tung University
Keywords :
CMOS process; CMOS technology; Crystal microstructure; Crystalline materials; Crystallization; High K dielectric materials; High-K gate dielectrics; Inorganic materials; Technological innovation; Voltage;
Conference_Titel :
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4244-1507-6
Electronic_ISBN :
978-1-4244-1508-3
DOI :
10.1109/IEDM.2007.4418937
