DocumentCode :
2603305
Title :
Electromigration of TiPdAu Conductors
Author :
Pitetti, R.C.
Author_Institution :
Bell Telephone Laboratories Incorporated, 555 Union Blvd., Allentown, Pennsylvania, 18103
fYear :
1972
fDate :
26390
Firstpage :
171
Lastpage :
174
Abstract :
Electromigration is a momentum transfer process which can cause electrical opens in conductors. The seriousness of this problem increases as the conductor line width and thickness decreases leading to increases in current densities. There has been much data reported on aluminum conductors, but very little work has been reported on gold metal-lizations. The object of this work was to determine the lifetimes of gold conductors defined into realistic geometries. Two different test patterns were used: One was the collector to ground conductor in an experimental oscillator having line widths ranging from 2 to 5 mils. The second pattern used was a straight line pattern 125 mils long and 2 mils wide. These conductors were tested using glass, glazed ceramic and partially glazed ceramic substrates.
Keywords :
Aluminum; Ceramics; Conductors; Current density; Electromigration; Geometry; Glass; Gold; Oscillators; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1972. 10th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1972.362547
Filename :
4207919
Link To Document :
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