Title :
Failure Characteristics of Thin Film Capacitors
Author_Institution :
Bell Telephone Laboratories, Incorporated, 555 Union Boulevard, Allentown, Pennsylvania 18103
Abstract :
Failure characteristics of thin film capacitors are described in terms of lognormal statistics and acceleration factors are calculated from step stress and static stress testing over a limited range of stress levels. When extrapolations are made to use stress conditions, estimates of the failure probability are obtained. The range of stress conditions producing failures in a reasonable time interval is not adequate to determine whether linear or log-voltage-stress is appropriate for extrapolation. One case yields pessimistically high failure rates and might be rationalized by an extension of the commonly accepted anodization mechanism. This model assumes linear-voltage-stress to failure is linear with log-time to failure.
Keywords :
Capacitors; Dielectric thin films; Extrapolation; Parametric statistics; Performance evaluation; Probability; Stress; Testing; Transistors; Voltage;
Conference_Titel :
Reliability Physics Symposium, 1972. 10th Annual
Conference_Location :
Las Vegas, NV, USA
DOI :
10.1109/IRPS.1972.362549