DocumentCode
2603484
Title
Gate Current Degradation Mechanisms of GaN High Electron Mobility Transistors
Author
Joh, Jungwoo ; Xia, Ling ; del Alamo, Jesús A.
Author_Institution
MIT, Cambridge
fYear
2007
fDate
10-12 Dec. 2007
Firstpage
385
Lastpage
388
Abstract
In spite of their extraordinary performance, GaN HEMTs still lack solid reliability. Gate current degradation during RF power device operation is a great concern because it impacts PAE, gain, and output power. In this paper, we have experimentally studied gate current degradation under high forward and reverse bias conditions on the gate. We find that strong reverse bias on the gate produces defects that become paths for excess IG. On the other hand, strong forward bias on the gate degrades Schottky junction probably due to thermal effects.
Keywords
III-V semiconductors; gallium compounds; high electron mobility transistors; power semiconductor devices; wide band gap semiconductors; GaN; Schottky junction; extraordinary performance; gate current degradation mechanisms; high electron mobility transistors; reverse bias conditions; Gallium nitride; HEMTs; MODFETs; Power generation; Radio frequency; Solids; Stress; Testing; Thermal degradation; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location
Washington, DC
Print_ISBN
978-1-4244-1507-6
Electronic_ISBN
978-1-4244-1508-3
Type
conf
DOI
10.1109/IEDM.2007.4418953
Filename
4418953
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