• DocumentCode
    2603484
  • Title

    Gate Current Degradation Mechanisms of GaN High Electron Mobility Transistors

  • Author

    Joh, Jungwoo ; Xia, Ling ; del Alamo, Jesús A.

  • Author_Institution
    MIT, Cambridge
  • fYear
    2007
  • fDate
    10-12 Dec. 2007
  • Firstpage
    385
  • Lastpage
    388
  • Abstract
    In spite of their extraordinary performance, GaN HEMTs still lack solid reliability. Gate current degradation during RF power device operation is a great concern because it impacts PAE, gain, and output power. In this paper, we have experimentally studied gate current degradation under high forward and reverse bias conditions on the gate. We find that strong reverse bias on the gate produces defects that become paths for excess IG. On the other hand, strong forward bias on the gate degrades Schottky junction probably due to thermal effects.
  • Keywords
    III-V semiconductors; gallium compounds; high electron mobility transistors; power semiconductor devices; wide band gap semiconductors; GaN; Schottky junction; extraordinary performance; gate current degradation mechanisms; high electron mobility transistors; reverse bias conditions; Gallium nitride; HEMTs; MODFETs; Power generation; Radio frequency; Solids; Stress; Testing; Thermal degradation; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2007. IEDM 2007. IEEE International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    978-1-4244-1507-6
  • Electronic_ISBN
    978-1-4244-1508-3
  • Type

    conf

  • DOI
    10.1109/IEDM.2007.4418953
  • Filename
    4418953