• DocumentCode
    2603514
  • Title

    Drain Corrosion in RF Power GaAs PHEMTs

  • Author

    Villanueva, A. ; del Alamo, J.A. ; Hisaka, T. ; Ishida, T.

  • Author_Institution
    MIT, Cambridge
  • fYear
    2007
  • fDate
    10-12 Dec. 2007
  • Firstpage
    393
  • Lastpage
    396
  • Abstract
    We have investigated drain degradation in a set of experimental RF power GaAs PHEMTs. Drain degradation was observed in the form of an increase in RD and a reduction in Imax in a variety of conditions. We found that both forms of degradation arise from surface corrosion that takes place on different locations on the drain and dominate in different regimes of operation. Specifically, the increase in RDwas prominent in the ON-state and was found to be associated with corrosion on the drain n+GaAs ledge. The reduction in Imax, in contrast, was prominent in the OFF-state and was associated with corrosion on the exposed AlGaAs barrier close to the gate. A significant finding is that in both cases, the drain-to-gate voltage emerges as a significant accelerating factor of drain corrosion.
  • Keywords
    corrosion; gallium arsenide; power HEMT; RF power PHEMT; drain corrosion; gallium arsenide; high electron mobility transistors; Acceleration; Corrosion; Degradation; Gallium arsenide; Laboratories; PHEMTs; Radio frequency; Radiofrequency identification; Temperature; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2007. IEDM 2007. IEEE International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    978-1-4244-1507-6
  • Electronic_ISBN
    978-1-4244-1508-3
  • Type

    conf

  • DOI
    10.1109/IEDM.2007.4418955
  • Filename
    4418955