DocumentCode
2603514
Title
Drain Corrosion in RF Power GaAs PHEMTs
Author
Villanueva, A. ; del Alamo, J.A. ; Hisaka, T. ; Ishida, T.
Author_Institution
MIT, Cambridge
fYear
2007
fDate
10-12 Dec. 2007
Firstpage
393
Lastpage
396
Abstract
We have investigated drain degradation in a set of experimental RF power GaAs PHEMTs. Drain degradation was observed in the form of an increase in RD and a reduction in Imax in a variety of conditions. We found that both forms of degradation arise from surface corrosion that takes place on different locations on the drain and dominate in different regimes of operation. Specifically, the increase in RDwas prominent in the ON-state and was found to be associated with corrosion on the drain n+GaAs ledge. The reduction in Imax, in contrast, was prominent in the OFF-state and was associated with corrosion on the exposed AlGaAs barrier close to the gate. A significant finding is that in both cases, the drain-to-gate voltage emerges as a significant accelerating factor of drain corrosion.
Keywords
corrosion; gallium arsenide; power HEMT; RF power PHEMT; drain corrosion; gallium arsenide; high electron mobility transistors; Acceleration; Corrosion; Degradation; Gallium arsenide; Laboratories; PHEMTs; Radio frequency; Radiofrequency identification; Temperature; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location
Washington, DC
Print_ISBN
978-1-4244-1507-6
Electronic_ISBN
978-1-4244-1508-3
Type
conf
DOI
10.1109/IEDM.2007.4418955
Filename
4418955
Link To Document