Title :
Long-wavelength VCSELs: the case for all-epitaxial approaches
Author_Institution :
Depts. of Electr. & Comput. Eng. & Mater., California Univ., Santa Barbara, CA, USA
Abstract :
For about a decade viable vertical-cavity surface emitting lasers (VCSELs) in the short wavelength 850-980 nm range have existed based upon the lattice matched InGaAs/AlGaAs/GaAs materials system. Reasonable devices extending into the visible (/spl sim/650 nm) have also been created more recently, generally using AlInGaP active layers. In most cases, devices are grown in a single epitaxial growth step, either by MBE or MOCVD approaches. In some cases, a top dielectric mirror has been employed, but the reliability of such approaches has not been fully verified. To date, all commercially successful devices have used all-epitaxial approaches. The paper reviews recent progress with the various approaches and focus in on the issues involved in the all-epitaxial approaches. From current progress, extrapolated levels of expected performance are also presented.
Keywords :
MOCVD; laser beams; laser cavity resonators; laser reliability; molecular beam epitaxial growth; optical fabrication; reviews; semiconductor lasers; surface emitting lasers; 650 nm; 850 to 980 nm; AlInGaP; AlInGaP active layers; InGaAs-AlGaAs-GaAs; InGaAs/AlGaAs/GaAs; MBE approach; MOCVD approach; VCSELs; all-epitaxial approach; all-epitaxial approaches; expected performance; extrapolated level; lattice matched materials; long-wavelength VCSELs; reliability; reviews; single epitaxial growth step; top dielectric mirror; vertical-cavity surface emitting lasers; visible region; Dielectric materials; Epitaxial growth; Gallium arsenide; Indium gallium arsenide; Lattices; Molecular beam epitaxial growth; Optical materials; Surface emitting lasers; Surface waves; Vertical cavity surface emitting lasers;
Conference_Titel :
Semiconductor Laser Conference, 2000. Conference Digest. 2000 IEEE 17th International
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-6259-4
DOI :
10.1109/ISLC.2000.882259