DocumentCode :
2603965
Title :
A parametric study of line defects in synthetic quartz crystal
Author :
Nagai, K. ; Hamaguchi, K. ; Kita, K. ; Asahara, J.
Author_Institution :
Toyo Commun. Equipment Co. Ltd., Kanagawa, Japan
fYear :
1997
fDate :
28-30 May 1997
Firstpage :
519
Lastpage :
526
Abstract :
A systematic and parametric study on line defects in synthetic quartz crystal and its culturing condition is needed to cope with the trend for the fabrication of quartz crystal resonator using chemical processing, since any of the etch channels are supposed to be originating from the line defects. It is reported in this paper that there are two kinds of line defects, and that numbers of those extending to the peak of cobbles almost correspond to those of the etch channels. Also, it is shown that the way of treating the seed crystal as well as the selection of alkali solution for culturing has a big impact on the formation of line defects
Keywords :
crystal resonators; etching; quartz; vacancies (crystal); SiO2; alkali solution; chemical processing; culturing condition; etch channels; line defects; quartz crystal resonator; seed crystal; synthetic quartz crystal; Chemical analysis; Chemical processes; Chemical products; Communication equipment; Etching; Facsimile; Frequency; IEC standards; Parametric study; Telephony;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium, 1997., Proceedings of the 1997 IEEE International
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-3728-X
Type :
conf
DOI :
10.1109/FREQ.1997.638653
Filename :
638653
Link To Document :
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