• DocumentCode
    2604398
  • Title

    ZnO Thin Film Transistor Ring Oscillators with sub 75 nsec Propagation Delay

  • Author

    Sun, Jie ; Mourey, Devin A. ; Zhao, Dalong ; Park, Sung Kyu ; Nelson, Shelby F. ; Levy, David H. ; Freeman, Diane ; Cowdery-Corvan, Peter ; Tutt, Lee ; Jackson, Thomas N.

  • Author_Institution
    Penn State Univ., University Park
  • fYear
    2007
  • fDate
    10-12 Dec. 2007
  • Firstpage
    579
  • Lastpage
    582
  • Abstract
    We have fabricated simple circuits, including ring oscillators, using ZnO thin films deposited by low temperature (200degC) atmospheric pressure chemical vapor deposition. Bottom gate TFTs with aluminum source and drain contacts typically had field effect mobility >15 cm2/Vs. Seven stage ring oscillators operated at frequency as high as 1 MHz for a supply voltage of 32 V, corresponding to a propagation delay less than 75 nsec/stage. These circuits also had propagation delay less than 150 ns/stage at a supply voltage of 18 V. To our knowledge, these are the fastest ZnO circuits reported to date.
  • Keywords
    II-VI semiconductors; chemical vapour deposition; field effect transistors; semiconductor thin films; thin film transistors; zinc compounds; ZnO; aluminum source; bottom gate TFT; chemical vapor deposition; drain contacts; field effect mobility; low-temperature atmospheric pressure CVD; propagation delay; ring oscillators; temperature 200 C; thin film transistor fabrication; voltage 18 V; voltage 32 V; Aluminum; Chemical vapor deposition; Frequency; Propagation delay; Ring oscillators; Sputtering; Temperature; Thin film circuits; Thin film transistors; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2007. IEDM 2007. IEEE International
  • Conference_Location
    Washington, DC
  • Print_ISBN
    978-1-4244-1507-6
  • Electronic_ISBN
    978-1-4244-1508-3
  • Type

    conf

  • DOI
    10.1109/IEDM.2007.4419005
  • Filename
    4419005