DocumentCode :
2604398
Title :
ZnO Thin Film Transistor Ring Oscillators with sub 75 nsec Propagation Delay
Author :
Sun, Jie ; Mourey, Devin A. ; Zhao, Dalong ; Park, Sung Kyu ; Nelson, Shelby F. ; Levy, David H. ; Freeman, Diane ; Cowdery-Corvan, Peter ; Tutt, Lee ; Jackson, Thomas N.
Author_Institution :
Penn State Univ., University Park
fYear :
2007
fDate :
10-12 Dec. 2007
Firstpage :
579
Lastpage :
582
Abstract :
We have fabricated simple circuits, including ring oscillators, using ZnO thin films deposited by low temperature (200degC) atmospheric pressure chemical vapor deposition. Bottom gate TFTs with aluminum source and drain contacts typically had field effect mobility >15 cm2/Vs. Seven stage ring oscillators operated at frequency as high as 1 MHz for a supply voltage of 32 V, corresponding to a propagation delay less than 75 nsec/stage. These circuits also had propagation delay less than 150 ns/stage at a supply voltage of 18 V. To our knowledge, these are the fastest ZnO circuits reported to date.
Keywords :
II-VI semiconductors; chemical vapour deposition; field effect transistors; semiconductor thin films; thin film transistors; zinc compounds; ZnO; aluminum source; bottom gate TFT; chemical vapor deposition; drain contacts; field effect mobility; low-temperature atmospheric pressure CVD; propagation delay; ring oscillators; temperature 200 C; thin film transistor fabrication; voltage 18 V; voltage 32 V; Aluminum; Chemical vapor deposition; Frequency; Propagation delay; Ring oscillators; Sputtering; Temperature; Thin film circuits; Thin film transistors; Zinc oxide;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4244-1507-6
Electronic_ISBN :
978-1-4244-1508-3
Type :
conf
DOI :
10.1109/IEDM.2007.4419005
Filename :
4419005
Link To Document :
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