DocumentCode
2604398
Title
ZnO Thin Film Transistor Ring Oscillators with sub 75 nsec Propagation Delay
Author
Sun, Jie ; Mourey, Devin A. ; Zhao, Dalong ; Park, Sung Kyu ; Nelson, Shelby F. ; Levy, David H. ; Freeman, Diane ; Cowdery-Corvan, Peter ; Tutt, Lee ; Jackson, Thomas N.
Author_Institution
Penn State Univ., University Park
fYear
2007
fDate
10-12 Dec. 2007
Firstpage
579
Lastpage
582
Abstract
We have fabricated simple circuits, including ring oscillators, using ZnO thin films deposited by low temperature (200degC) atmospheric pressure chemical vapor deposition. Bottom gate TFTs with aluminum source and drain contacts typically had field effect mobility >15 cm2/Vs. Seven stage ring oscillators operated at frequency as high as 1 MHz for a supply voltage of 32 V, corresponding to a propagation delay less than 75 nsec/stage. These circuits also had propagation delay less than 150 ns/stage at a supply voltage of 18 V. To our knowledge, these are the fastest ZnO circuits reported to date.
Keywords
II-VI semiconductors; chemical vapour deposition; field effect transistors; semiconductor thin films; thin film transistors; zinc compounds; ZnO; aluminum source; bottom gate TFT; chemical vapor deposition; drain contacts; field effect mobility; low-temperature atmospheric pressure CVD; propagation delay; ring oscillators; temperature 200 C; thin film transistor fabrication; voltage 18 V; voltage 32 V; Aluminum; Chemical vapor deposition; Frequency; Propagation delay; Ring oscillators; Sputtering; Temperature; Thin film circuits; Thin film transistors; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location
Washington, DC
Print_ISBN
978-1-4244-1507-6
Electronic_ISBN
978-1-4244-1508-3
Type
conf
DOI
10.1109/IEDM.2007.4419005
Filename
4419005
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