DocumentCode :
2604471
Title :
Nichrome Resistor Failures as Studied by X-ray Photoelectron Spectroscopy (XPS or ESCA)
Author :
Baitinger, W.E. ; Winograd, N. ; Amy, J.W. ; Munarin, J.A.
Author_Institution :
Department of Chemistry, Purdue University, West Lafayette, Indiana 47907
fYear :
1974
fDate :
27120
Firstpage :
1
Lastpage :
6
Abstract :
Depth profiles yielding both information on oxidation state and elemental composition have been obtained for model nichrome films by using X-ray Photo-electron Spectroscopy and argon ion sputtering. Evidence is presented showing the formation of thin insulating films at the interface between two metals caused by solid state reactions occuring between metals and metal oxides.
Keywords :
Chemical analysis; Chromium; Electrons; Energy measurement; Information analysis; Oxidation; Resistors; Spectroscopy; Sputtering; Surface cleaning;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1974. 12th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1974.362619
Filename :
4207997
Link To Document :
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