Title :
Laser performance comparison of long-wavelength strained InGaNAs and InGaAs QW laser diodes grown by AP-MOVPE
Author :
Mereuta, A. ; Bouchoule, S. ; Sagnes, I. ; Alexandre, F. ; Sik, H. ; Decobert, J.
Author_Institution :
URA250-CDP, Bagneux, France
Abstract :
New InGa(N)As/GaAs structures have recently been presented as an interesting alternative to InP-based materials, due to the possibility of realising the 1.3 and 1.55 /spl mu/m lasers on a GaAs substrate, and to a strong electron confinement at the interfaces between the InGaNAs active layer and the AlGaAs or InGaP cladding layers. Improved thermal performance is thus expected from the InGaAsN-based lasers. In the work we present a comparative study of the laser characteristics of strain InGa(N)As/GaAs QWs structures grown on a GaAs substrate by atmospheric pressure. Dimethylhydrazine has been used as source of nitrogen for the growth, and the growth conditions (temperature, V/III flux ratio, ratio of DMHB in the gas phase) has been chosen to obtain a mirror like surface and maximum nitrogen incorporation.
Keywords :
III-V semiconductors; MOCVD; current density; gallium arsenide; gallium compounds; indium compounds; laser beams; optical fabrication; quantum well lasers; semiconductor growth; vapour phase epitaxial growth; 1 atm; 1.3 mum; 1.5 mum; AP-MOVPE; AlGaAs; InGa(N)As/GaAs structures; InGaAs; InGaAs-GaAs; InGaAs/GaAs structures; InGaNAs; InGaNAs-GaAs; InGaNAs/GaAs structures; InGaP; InP-based materials; V/III flux ratio; atmospheric pressure; dimethylhydrazine; gas phase; growth conditions; laser characteristics; laser performance; long-wavelength strained quantum well laser diodes; maximum N/sub 2/ incorporation; mirror like surface; quantum well structures; temperature; Annealing; Diode lasers; Gallium arsenide; Indium gallium arsenide; Nitrogen; Optical materials; Pulse measurements; Temperature distribution; Temperature measurement; Threshold current;
Conference_Titel :
Semiconductor Laser Conference, 2000. Conference Digest. 2000 IEEE 17th International
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-6259-4
DOI :
10.1109/ISLC.2000.882314