DocumentCode :
2604658
Title :
High power quantum dot lasers at 1140 nm
Author :
Ribbat, Ch. ; Sellin, R. ; Grundmann, M. ; Bimberg, D.
Author_Institution :
Inst. fur Festkorperphys., Tech. Univ. Berlin, Germany
fYear :
2000
fDate :
25-28 Sept. 2000
Firstpage :
131
Lastpage :
132
Abstract :
We demonstrate quantum dot lasers at 1140 nm with record high optical output power of 5 W. The use of novel tunneling barriers allows us to improve the characteristic temperature, T/sub 0/. A detailed investigation is presented of the impact of barrier design on the characteristic temperature for QD lasers. The quantum dot lasers were grown by low-pressure Metalorganic Chemical Vapor Phase Deposition (MOCVD). The active layer consists of stacks of InGaAs quantum dots in a GaAs matrix. Ridge waveguide lasers with 200 /spl mu/m stripe-width exhibit a total optical output power up to 5 W in pulsed operation at room temperature.
Keywords :
III-V semiconductors; MOCVD; gallium arsenide; indium compounds; laser beams; quantum well lasers; ridge waveguides; semiconductor quantum dots; tunnelling; waveguide lasers; 1140 nm; 200 mum; 298 K; 5 W; GaAs; GaAs matrix; InGaAs; InGaAs quantum dots; MOCVD; active layer; barrier design; characteristic temperature; high optical output power; high power quantum dot lasers; low-pressure metalorganic chemical vapor phase deposition; pulsed operation; quantum dot lasers; ridge waveguide lasers; room temperature; stripe-width; total optical output power; tunneling barriers; Chemical lasers; Optical recording; Optical waveguides; Power generation; Power lasers; Pulsed laser deposition; Quantum dot lasers; Temperature; Tunneling; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Laser Conference, 2000. Conference Digest. 2000 IEEE 17th International
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-6259-4
Type :
conf
DOI :
10.1109/ISLC.2000.882322
Filename :
882322
Link To Document :
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