Title : 
Reliability of Silicon and Gallium Arsenide KA-Band Impatt Diodes
         
        
            Author : 
Staecker, P. ; Lindley, W.T. ; Murphy, R.A. ; Donnelly, J.P.
         
        
            Author_Institution : 
Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, Massachusetts 02173
         
        
        
        
        
        
            Abstract : 
Fixed junction temperature operating tests have been conducted on two types of Ka-band IMPATT diodes: commercially available silicon devices, and gallium arsenide devices fabricated in-house. Median operational life of 106 hours at a junction temperature of 200°C has been predicted for the silicon devices, and the dominant failure mechanism has been identified as a localized penetration weakness of the platinum barrier layer. Experiments on the metallization layers of the GaAs devices have produced diodes with lower operating temperatures for a given added power, and longer life at the only operating temperature where the two devices have been compared, 350°C.
         
        
            Keywords : 
Conductivity; Fabrication; Gallium arsenide; Laboratories; Life testing; Metallization; Power system reliability; Schottky diodes; Silicon devices; Temperature;
         
        
        
        
            Conference_Titel : 
Reliability Physics Symposium, 1974. 12th Annual
         
        
            Conference_Location : 
Las Vegas, NV, USA
         
        
        
        
            DOI : 
10.1109/IRPS.1974.362660