DocumentCode :
2605121
Title :
Reliability of Silicon and Gallium Arsenide KA-Band Impatt Diodes
Author :
Staecker, P. ; Lindley, W.T. ; Murphy, R.A. ; Donnelly, J.P.
Author_Institution :
Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, Massachusetts 02173
fYear :
1974
fDate :
27120
Firstpage :
293
Lastpage :
297
Abstract :
Fixed junction temperature operating tests have been conducted on two types of Ka-band IMPATT diodes: commercially available silicon devices, and gallium arsenide devices fabricated in-house. Median operational life of 106 hours at a junction temperature of 200°C has been predicted for the silicon devices, and the dominant failure mechanism has been identified as a localized penetration weakness of the platinum barrier layer. Experiments on the metallization layers of the GaAs devices have produced diodes with lower operating temperatures for a given added power, and longer life at the only operating temperature where the two devices have been compared, 350°C.
Keywords :
Conductivity; Fabrication; Gallium arsenide; Laboratories; Life testing; Metallization; Power system reliability; Schottky diodes; Silicon devices; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1974. 12th Annual
Conference_Location :
Las Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1974.362660
Filename :
4208038
Link To Document :
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