• DocumentCode
    2605121
  • Title

    Reliability of Silicon and Gallium Arsenide KA-Band Impatt Diodes

  • Author

    Staecker, P. ; Lindley, W.T. ; Murphy, R.A. ; Donnelly, J.P.

  • Author_Institution
    Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, Massachusetts 02173
  • fYear
    1974
  • fDate
    27120
  • Firstpage
    293
  • Lastpage
    297
  • Abstract
    Fixed junction temperature operating tests have been conducted on two types of Ka-band IMPATT diodes: commercially available silicon devices, and gallium arsenide devices fabricated in-house. Median operational life of 106 hours at a junction temperature of 200°C has been predicted for the silicon devices, and the dominant failure mechanism has been identified as a localized penetration weakness of the platinum barrier layer. Experiments on the metallization layers of the GaAs devices have produced diodes with lower operating temperatures for a given added power, and longer life at the only operating temperature where the two devices have been compared, 350°C.
  • Keywords
    Conductivity; Fabrication; Gallium arsenide; Laboratories; Life testing; Metallization; Power system reliability; Schottky diodes; Silicon devices; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 1974. 12th Annual
  • Conference_Location
    Las Vegas, NV, USA
  • ISSN
    0735-0791
  • Type

    conf

  • DOI
    10.1109/IRPS.1974.362660
  • Filename
    4208038