DocumentCode
2605121
Title
Reliability of Silicon and Gallium Arsenide KA-Band Impatt Diodes
Author
Staecker, P. ; Lindley, W.T. ; Murphy, R.A. ; Donnelly, J.P.
Author_Institution
Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, Massachusetts 02173
fYear
1974
fDate
27120
Firstpage
293
Lastpage
297
Abstract
Fixed junction temperature operating tests have been conducted on two types of Ka-band IMPATT diodes: commercially available silicon devices, and gallium arsenide devices fabricated in-house. Median operational life of 106 hours at a junction temperature of 200°C has been predicted for the silicon devices, and the dominant failure mechanism has been identified as a localized penetration weakness of the platinum barrier layer. Experiments on the metallization layers of the GaAs devices have produced diodes with lower operating temperatures for a given added power, and longer life at the only operating temperature where the two devices have been compared, 350°C.
Keywords
Conductivity; Fabrication; Gallium arsenide; Laboratories; Life testing; Metallization; Power system reliability; Schottky diodes; Silicon devices; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1974. 12th Annual
Conference_Location
Las Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1974.362660
Filename
4208038
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