Title :
Towards reliability improvement for nanoelectronic circuits using gate replication
Author :
Chen, Chunhong ; Zhou, Feng
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Windsor, Windsor, ON
Abstract :
To make digital circuits with unreliable devices more reliable has been a big challenge, especially for today´s nanoelectronic circuit design. This paper presents a gate replication architecture towards increasing the reliability of individual nano-scale digital logic gates. We focus on deriving the fundamental relationship between gate replication and reliability improvement, and report both theoretical analysis and experimental results.
Keywords :
digital circuits; logic gates; nanoelectronics; gate replication architecture; nanoelectronic circuit design; nanoscale digital logic gates; reliability improvement; Capacitance; Digital circuits; Electrons; Logic devices; Logic gates; Nanoscale devices; Nanotechnology; Probability distribution; Redundancy; Threshold voltage;
Conference_Titel :
Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-0607-4
Electronic_ISBN :
978-1-4244-0608-1
DOI :
10.1109/NANO.2007.4601262
