DocumentCode
2605506
Title
Towards reliability improvement for nanoelectronic circuits using gate replication
Author
Chen, Chunhong ; Zhou, Feng
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Windsor, Windsor, ON
fYear
2007
fDate
2-5 Aug. 2007
Firstpage
597
Lastpage
600
Abstract
To make digital circuits with unreliable devices more reliable has been a big challenge, especially for today´s nanoelectronic circuit design. This paper presents a gate replication architecture towards increasing the reliability of individual nano-scale digital logic gates. We focus on deriving the fundamental relationship between gate replication and reliability improvement, and report both theoretical analysis and experimental results.
Keywords
digital circuits; logic gates; nanoelectronics; gate replication architecture; nanoelectronic circuit design; nanoscale digital logic gates; reliability improvement; Capacitance; Digital circuits; Electrons; Logic devices; Logic gates; Nanoscale devices; Nanotechnology; Probability distribution; Redundancy; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-0607-4
Electronic_ISBN
978-1-4244-0608-1
Type
conf
DOI
10.1109/NANO.2007.4601262
Filename
4601262
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