• DocumentCode
    2605914
  • Title

    A novel Spin Injection Field Effect Transistor

  • Author

    Wan, J. ; Cahay, M. ; Bandyopadhyay, S.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Cincinnati Univ., Cincinnati, OH
  • fYear
    2007
  • fDate
    2-5 Aug. 2007
  • Firstpage
    700
  • Lastpage
    703
  • Abstract
    We describe a new Spin Injection Field Effect Transistor (SIFET) with a quasi one-dimensional semiconductor channel and ferromagnetic source/drain contacts. We show that even when the ferromagnetic contacts are non-ideal with less than 100% spin polarization, the spin injection efficiency from the source into the channel can be switched from nearly +100 % to nearly +100 % with a small swing in gate bias at a temperature of 0 K. This corresponds to switching from mostly majority spin injection to mostly minority spin injection at the source end. If the spin polarization in the drain has the same sign as that in the source, then the drain will preferentially transmit injected majority spins while blocking minority spins. Therefore, one can switch the drain current from a maximum value to nearly zero with the gate bias (if there is no spin relaxation in the channel), thereby realizing transistor action. The current modulation and transistor action deteriorate with increasing temperature.
  • Keywords
    ferromagnetic materials; field effect transistors; magnetoelectronics; spin polarised transport; SIFET; current modulation; drain current switching; ferromagnetic source-drain contacts; quasione-dimensional semiconductor channel; spin injection field effect transistor; spin polarization; Charge carriers; Contacts; Dispersion; FETs; Leakage current; Nanotechnology; Polarization; Spin polarized transport; Switches; Temperature; Rashba spin-orbit interaction; Spin Field Effect Transistors; Spin injection efficiency; nanowires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-0607-4
  • Electronic_ISBN
    978-1-4244-0608-1
  • Type

    conf

  • DOI
    10.1109/NANO.2007.4601285
  • Filename
    4601285