Title :
Current Capabilities and Future Prospects of Atomistic Process Simulation
Author :
Jaraiz, M. ; Castrillo, P. ; Pinacho, R. ; Rubio, J.E.
Author_Institution :
Univ. of Valladolid, Valladolid
Abstract :
Atomistic process simulators, based on the Kinetic Monte Carlo (KMC) scheme, are an attempt to fulfill some of the ITRS expectations for process modeling and simulation. We present a general overview of its conception and evolution up to its current state, show some of the latest developments, and discuss the possible trends in atomistic process simulation for the coming years.
Keywords :
MOSFET; Monte Carlo methods; semiconductor process modelling; ITRS; atomistic process simulation; high-performance MOSFET devices; kinetic Monte Carlo scheme; process modeling; Atomic layer deposition; CMOS process; Fluctuations; Impurities; Kinetic theory; MOSFET circuits; Manufacturing processes; Monte Carlo methods; Predictive models; Simulated annealing;
Conference_Titel :
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4244-1507-6
Electronic_ISBN :
978-1-4244-1508-3
DOI :
10.1109/IEDM.2007.4419110
