DocumentCode
2606531
Title
Development of a Production-Ready, Back-Illuminated CMOS Image Sensor with Small Pixels
Author
Joy, Tom ; Pyo, Sunggyu ; Park, Sunghyung ; Choi, Changhoon ; Palsule, Chintamani ; Han, Hyungjun ; Feng, Chen ; Lee, Sangjoo ; McKee, Jeff ; Altice, Parker ; Hong, Chris ; Boemler, Christian ; Hynecek, Jerry ; Louie, Michael ; Lee, Juil ; Kim, Daebyung ;
Author_Institution
Adv. Pixel Res. Center, Lake Oswego
fYear
2007
fDate
10-12 Dec. 2007
Firstpage
1007
Lastpage
1010
Abstract
A back-illuminated 2 megapixel CMOS sensor utilizing mature wafer manufacturing operations is described. Sensitivity, dark current and other key pixel performance measures are compared against an equivalent conventional sensor. Aspects of the process integration that make the technology manufacturable are described. Simulations that predict the performance of a full color sensor are discussed.
Keywords
CMOS image sensors; back-illuminated CMOS image sensor; wafer manufacturing; CMOS image sensors; CMOS technology; Dark current; Fabrication; Pixel; Predictive models; Sensor phenomena and characterization; Silicon; Temperature; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location
Washington, DC
Print_ISBN
978-1-4244-1507-6
Electronic_ISBN
978-1-4244-1508-3
Type
conf
DOI
10.1109/IEDM.2007.4419125
Filename
4419125
Link To Document