DocumentCode :
2606531
Title :
Development of a Production-Ready, Back-Illuminated CMOS Image Sensor with Small Pixels
Author :
Joy, Tom ; Pyo, Sunggyu ; Park, Sunghyung ; Choi, Changhoon ; Palsule, Chintamani ; Han, Hyungjun ; Feng, Chen ; Lee, Sangjoo ; McKee, Jeff ; Altice, Parker ; Hong, Chris ; Boemler, Christian ; Hynecek, Jerry ; Louie, Michael ; Lee, Juil ; Kim, Daebyung ;
Author_Institution :
Adv. Pixel Res. Center, Lake Oswego
fYear :
2007
fDate :
10-12 Dec. 2007
Firstpage :
1007
Lastpage :
1010
Abstract :
A back-illuminated 2 megapixel CMOS sensor utilizing mature wafer manufacturing operations is described. Sensitivity, dark current and other key pixel performance measures are compared against an equivalent conventional sensor. Aspects of the process integration that make the technology manufacturable are described. Simulations that predict the performance of a full color sensor are discussed.
Keywords :
CMOS image sensors; back-illuminated CMOS image sensor; wafer manufacturing; CMOS image sensors; CMOS technology; Dark current; Fabrication; Pixel; Predictive models; Sensor phenomena and characterization; Silicon; Temperature; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2007. IEDM 2007. IEEE International
Conference_Location :
Washington, DC
Print_ISBN :
978-1-4244-1507-6
Electronic_ISBN :
978-1-4244-1508-3
Type :
conf
DOI :
10.1109/IEDM.2007.4419125
Filename :
4419125
Link To Document :
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