DocumentCode
2606903
Title
An Investigation of Flaws in Complex CMOS Devices by a Scanning Photoexcitation Technique
Author
Levy, Miguel E.
Author_Institution
Hughes Aircraft Company, Culver City, California. (213) 391-0711 Ext. 6257
fYear
1977
fDate
28216
Firstpage
44
Lastpage
53
Abstract
A new method is described for using the optical scanner as an inspection instrument for complex CMOS microcircuits. Named the State Superposition Technique, the new method generates a photoresponse image that contains contributions from all active elements in the DUT. Results obtained with CMOS life-test specimens are presented.
Keywords
Character generation; Circuit testing; Image analysis; Image generation; Inspection; Instruments; Optical devices; Optical sensors; P-n junctions; Photoconductivity;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 1977. 15th Annual
Conference_Location
LAs Vegas, NV, USA
ISSN
0735-0791
Type
conf
DOI
10.1109/IRPS.1977.362771
Filename
4208158
Link To Document